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Engineers at a semiconductor manufacturing facility want to test whether different wafer implant material dosages
Engineers at a semiconductor manufacturing facility want to test whether different wafer implant material dosages
have a significant effect on resistivity measurements after a diffusion process taking place in a furnace. They have 4 different dosages they want to try and enough experimental wafers from the same batch to run 3 wafers at each of the dosages. There is only enough capacity to put 4 wafers in the furnace at any one time.
Which of the following is best described as the "block" in this experiment?
Group of answer choices
The dosage level
The furnace run
The experimental wafers
The resistivity
