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For a photoresist that can resolve MTF=0.4, if the exposure system has NA=0.75, use gline =436nm, spatial coherence S=0.5. What is the resolution

For a photoresist that can resolve MTF=0.4, if the exposure system has NA=0.75, use gline λ=436nm, spatial coherence S=0.5. What is the resolution (half pitch W)? If using iline (365nm) exposure, what is the resolution?  

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