Problem 1: Electron beam lithography (30 points) The beam spot of vector scan electron beam lithography system has a Gaussian form. The current...

this is the problem statement its on electron beam lithography

Problem 1: Electron beam lithography (30 points)The beam spot of vector scan electron beam lithography system has a Gaussian form. Thecurrent density (A/sz) as a function of radial distance from the beam center is (1) If the dosage is required to properly expose the resist is D0 (C/cmz), at what speedV(cm/sec) must the beam be scanned across the surface to develop a linewidthW(cm) in a thin resist layer (Assume no scattering from the substrate). If you need, TBXP ‘LYZ/az)dx =a J; you can use this integration formula. 4°